SEMI F1
- Specification for Leak Integrity of High-Purity Gas Piping Systems and Components
$100.00$150.00
This Standard was technically approved by the global Facilities Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on June 18, 2012. Available at www.semiviews.org and www.semi.org in August 2012; originally published in 1990; previously published in 1996.
This Specification defines the leak testing requirements and leakage rates for high-purity gas piping systems and components used in semiconductor manufacturing. It is also intended as an aid in the procurement and installation of equipment, materials, and services.
This Specification applies to high-purity gas piping systems and components used in semiconductor manufacturing facilities and comparable research and development areas.
It includes testing methods for complete systems, subsystems, and individual components.
It states requirements for both the user and manufacturer and establishes leak rate limits for acceptance testing and qualification testing.
Referenced SEMI Standards
SEMI S2 — Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment
Revision History
SEMI F1-0812 (technical revision)
SEMI F1-96 (technical revision)
SEMI F1-90 (first published)
Related Products
DS/EN 12952-6
Water-tube boilers and auxiliary installations – Part 6: Inspection during construction, documentati..
$43.00 $85.00
ASME BPVC-2015 SET-With Binders
2015 ASME Boiler and Pressure Vessel Code (BPVC) - Complete Set PLUS 34 ASME Approved Binders..
$7,500.00 $15,000.00
